Hada-Labo 極潤保濕化妝水-清爽型
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Water
Solvent1
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DPG
Solvent, Moisturizer1-2
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Glycerol
Solvent, Viscosity Control, Moisturizer1-2
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Hydrolyzed Hyaluronic Acid
Moisturizer1
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Sodium Acetylated Hyaluronate
Viscosity Control, Moisturizer1
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Hyaluronic Acid
Moisturizer1
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Disodium succinate
Surfactant1
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PPG-20 METHYL GLUCOSE ETHER
Antistatic, Moisturizer1
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Succinic acid
Astringent1
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Methylparaben
Preservative, Fragrance3-4